Depth profiling of thin plasma-polymerized amine films using GDOES in an Ar-O2 plasma

نویسندگان

چکیده

Thin polymer films were deposited on polished stainless-steel samples by PECVD from a cyclopropylamine precursor and characterized X-ray photoelectron spectroscopy, secondary-ion mass spectrometry glow-discharge optical emission spectroscopy (GDOES) depth profiling. These profiles exhibited reasonable agreement. The GDOES involved the erosion of in plasma sustained an asymmetric RF capacitively coupled discharge using both Ar Ar-O2 gases. application pure caused unwanted effects, such as broadening polymer-film/substrate interface, which suppressed when mixture with oxygen. Another benefit oxygen was significant increase etching rate factor about 15 compared to argon. mechanisms profiling gases elaborated some detail, taking into account parameters typical for asymmetric, small volume. main Ar/O2 respect XPS SIMS is increased sputtering films. Comparing Ar, benefits are higher better resolution at polymer/substrate interface.

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ژورنال

عنوان ژورنال: Applied Surface Science

سال: 2022

ISSN: ['1873-5584', '0169-4332']

DOI: https://doi.org/10.1016/j.apsusc.2021.152292